Memory cell with an asymmetrical area

ABSTRACT

An asymmetric-area memory cell, and a fabrication method for forming an asymmetric-area memory cell, are provided. The method comprises: forming a bottom electrode having an area; forming a CMR memory film overlying the bottom electrode, having an asymmetric area; and, forming a top electrode having an area, less than the bottom electrode area, overlying the CMR film. In one aspect, the CMR film has a first area adjacent the top electrode and a second area, greater than the first area, adjacent the bottom electrode. Typically, the CMR film first area is approximately equal to the top electrode area, although the CMR film second area may be less than the bottom electrode area.

RELATED APPLICATIONS

This application is a Divisional of a pending patent applicationentitled, ASYMMETRIC-AREA MEMORY CELL, invented by Hsu et al., Ser. No.10/730,726, filed Dec. 8, 2003, which is incorporated herein byreference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention generally relates to a thin film resistance memorydevice, for non-volatile memory arrays, and more particularly, to abipolar programmable memory cell having an asymmetric area.

2. Description of the Related Art

State of the art resistor random access memories (RRAMs) are often madefrom a colossal magnetoresistance (CMR) memory film and, more typically,from a Pr_(0.3)Ca_(0.7)MnO₃ (PCMO) type of CMR material. The CMRmaterial can be said to have a nonvolatile nature, as the resistance ofthe CMR material remains constant under most circumstances. However,when a high electric field induces current flow through the CMRmaterial, a change in the CMR resistance can result. During narrow-pulseprogramming, the resistivity of the memory resistor near an electrodechanges. Experimental data shows that the resistivity of the CMRmaterial near the cathode increases while that at the anode decreases.During the erase process the pulse polarity is reversed. That is, thedesignation of cathode and anode are reversed. Then, the resistivity ofthe material near the cathode decreases, and the resistivity near theanode increases.

FIG. 1 is a diagram of a symmetrical CMR film memory cell (prior art).The device is called symmetric because it has a uniform area along anycross-section of the CMR film thickness. The memory cell can be writtento high-resistance state using either positive or negative narrow pulse,and reset to low-resistance state using a long-width electrical pulse.Other memory cells (not shown) may be written to high resistance stateand erased to low-resistance state using a narrow negative pulse and anarrow positive pulse, respectively. A memory device that is responsiveto only one type of programming, either bipolar or uni-polar, has anecessarily limited usefulness, and is dependent upon systemspecifications and available power supplies.

Thus, some systems are designed for bipolar programming, whereas othersare designed for uni-polar programming, depending upon the type of CMRmemory cell being used. This uncertainty in the design of the memorycells necessarily increases production costs. Some CMR film memory celldesigns are made bipolar programmable by manipulating the composition ofthe film along the thickness of the RRAM resistor. As the memory cellsize is reduced, the thickness of the memory resistor thin film is alsoreduced. However, CMR film thickness can be a difficult variable tocontrol.

It would be advantageous if a CMR memory cell could be programmed usingbipolar, as well a uni-polar pulses.

It would be advantageous if a process for fabricating a CMR memory cellthat is responsive to either bipolar or unipolar programming, could bemade scalable for processes using increasing smaller feature sizes.

SUMMARY OF THE INVENTION

The present invention provides a CMR memory device structure that can bereliably programmed using a bipolar pulse programming process.Alternately, the device can be programmed using a uni-polar pulseprogramming process. The flexibility in programming is a result of thedevice's unique asymmetric-area design.

Accordingly, a method is provided for forming an asymmetric-area memorycell. The method comprises: forming a bottom electrode having an area;forming a CMR memory film overlying the bottom electrode, having anasymmetric area; and, forming a top electrode having an area, less thanthe bottom electrode area, overlying the CMR film. In one aspect, theCMR film has a first area adjacent the top electrode and a second area,greater than the first area, adjacent the bottom electrode. Typically,the CMR film first area is approximately equal to the top electrodearea, although the CMR film second area may be less than the bottomelectrode area.

More specifically, the method comprises: isotropically depositing abottom electrode layer; isotropically depositing a CMR film layer,having a first thickness, overlying the bottom electrode layer; and,isotropically depositing a top electrode layer overlying the CMR filmlayer. Then, the top electrode layer and a second thickness portion ofthe CMR film layer are etched to form the top electrode area and the CMRfilm first area. A first set of sidewall insulators is formed adjacentthe top electrode and the second thickness portion of the CMR film.Then, the CMR film second area is formed by etching the remainingportion of the CMR film layer, leaving a third thickness portion of theCMR film second area underlying the first set of sidewall insulators,where the third thickness is equal to the first thickness minus thesecond thickness.

A second set of sidewall insulators is formed overlaying the first setof sidewall insulators and adjacent the third thickness portion of theCMR film. Then, the bottom electrode layer is etched, leaving a bottomelectrode area underlying the first and second set of sidewallinsulators.

Additional details of the above-described method, a method forprogramming an asymmetric-area memory cell using either bipolar oruni-polar pulses, an asymmetric-area memory cell device, and anasymmetric-area RRAM are provided below.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a diagram of a symmetrical CMR film memory cell (prior art).

FIG. 2 is a diagram illustrating the present invention asymmetric-areamemory cell.

FIG. 3 is a plan view of the asymmetric-area memory cell of FIG. 2.

FIG. 4 is a diagram of the present invention RRAM asymmetric-area memorycell.

FIG. 5 illustrates an initial step in the present invention memory cellfabrication process.

FIGS. 6 a through 6 d illustrate additional steps in the fabrication ofan RRAM memory cell using the asymmetric-area CMR film.

FIG. 7 is a flowchart illustrating the present invention method forforming an asymmetric-area memory cell.

FIG. 8 is a flowchart illustrating the present invention method forforming an RRAM asymmetric-area memory cell.

FIG. 9 is a flowchart illustrating the present invention method forprogramming an asymmetric-area memory cell using bipolar and uni-polarpulses.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

FIG. 2 is a diagram illustrating the present invention asymmetric-areamemory cell. The asymmetric-area memory cell 100 comprises a bottomelectrode 102 (BE) having an area 104. A colossal magnetoresistance(CMR) memory film 106 overlies the bottom electrode 102, having anasymmetric area 108. A top electrode 110 (TE) has an area 112, less thanthe bottom electrode area 104, overlying the CMR film 106. Morespecifically, the CMR film 106 has a first area 114 adjacent the topelectrode 110 and a second area 116, greater than the first area 114,adjacent the bottom electrode 102. Typically, the CMR memory film 106 isformed from Pr_(0.3)Ca_(0.7)MnO₃ (PCMO). However, other materials arealso known in the art such as high temperature super conducting (HTSC),and perovskite metal oxide materials.

FIG. 3 is a plan view of the asymmetric-area memory cell of FIG. 2. Asused herein, the word “area” is understood to be a cross-sectionalregion when viewed from the perspective of FIG. 2. The areas 104, 110,and 116 are shown in phantom (dotted lines) to illustrate the relativearea sizes. As can be seen, the CMR film first area 114 is approximatelyequal to the top electrode area 112. The term “approximately” is used toaccount for typical tolerances in the fabrication process. As explainedbelow, area 114 may be slightly larger that area 112, due to the factthat the top electrode 110 is exposed to etchant for a greater period oftime. However, in other aspects, area 112 may be slightly larger thatarea 114, in response to the etch selectivity of the CMR and electrodematerials.

The CMR second area 116 is shown as less than the bottom electrode area104, as explained in more detail below. However, in other aspects, theCMR second area 116 and the bottom electrode area 104 can be the same.Although the areas 104, 110, 114, and 116 are shown as approximatelysquare in shape, in other aspects the areas may be rectangular,circular, or oval in shape.

Returning to FIG. 2, the CMR memory film 106 has an overall firstthickness 120, a second thickness portion 122 with the first area 114,and a third thickness portion 124 with the second area 116 underlyingthe second thickness portion 122. The third thickness 124 is equal tothe first thickness 120 minus the second thickness 122. The CMR filmthird thickness 124 is in the range of 20 to 80% of the first thickness120. The first thickness 120 is in the range of 50 to 350 nanometers(nm).

Although the second and third thickness portions 122/124 are shown asstepped, or rectangular in shape, the invention is not limited to anyparticular shape. In other aspect (not shown), the CMR film asymmetricarea 108 has a cone shape, with a linear change in area from the firstarea 114 to the second area 116. In another aspect (not shown), theasymmetric area 108 has a stepped pyramid shape. Other asymmetric shapesare also possible.

A first set of sidewall insulators 130 a and 130 b is adjacent the topelectrode 110 and the second thickness portion 122 of the CMR film 106.A second set of sidewall insulators 132 a and 132 b overlies the firstset of sidewall insulators 130 a and 130 b and is adjacent the thirdthickness portion 124 of the CMR film 106.

The first set of sidewall insulators 130 a and 130 b is formed from amaterial such as silicon nitride or aluminum oxide. However, otherinsulator materials are known in the art. Each sidewall (130 a or 130 b)has a thickness 134 in the range of 50 to 200 nm. Likewise, the secondset of sidewall insulators 132 a and 132 b is formed from a materialsuch as silicon nitride or aluminum oxide, with each sidewall having athickness 136 in the range of 20 to 100 nm.

The bottom electrode 102 can be formed from a material such as TiN/Ti,Pt/TiN/Ti, In/TiN/Ti, PtRhOx compounds, or PtIrOx compounds. The topelectrode 110 is formed from a material such as TiN, TiN/Pt, TiN/In,PtRhOx compounds, or PtIrOx compounds. However, this is not anexhaustive list of materials and other electrode materials are known inthe art.

FIG. 4 is a diagram of the present invention RRAM asymmetric-area memorycell. The memory cell 300 comprises a CMOS transistor with source 302and drain 304 active regions. The memory cell also includes a metal (orconductive material) interlevel interconnect 306 overlying a transistoractive region. Although the interlevel interconnect 306 is shownconnected to the source 302, alternately it could be connected to thedrain 304. Bottom electrode 102, with area 104, overlies the interlevelinterconnect 306. The bottom electrode 102 is in electricalcommunication with the interconnect 306. The CMR memory film 106overlies the bottom electrode 102 and has an asymmetric area 108, asdescribed in detail above (see FIGS. 2 and 3). The top electrode 110 hasan area 112, less than the bottom electrode area 104, overlying the CMRfilm 106. In some aspects, a metal interlevel interconnect 308 overliesthe memory cell top electrode 110.

Functional Description

Returning to FIG. 2, the CMR memory thin film is shown after etching.Two sets of nitride spacers (130 a/b and 132 a/b) are formed on theetched surface. The first sets of spacers 130 a/b is used in the firstetching process. The remaining CMR film is etched and passivated with asecond nitride film. As a result, the top electrode area 112 is smallerthan that of the bottom electrode area 104. The device 100 is asymmetricand can be programmed using either bipolar narrow pulses or uni-polarpulses.

Although the figure shows single metal electrodes, both top and bottomelectrodes may also be made of multi-layer metals, such as TiN/Ti,Pt/TiN/Ti or In/TiN/Ti for bottom electrode, and TiN, TiN/Pt or TiN/Infor the top electrode. As mentioned above, other combinations ofmaterials are possible.

FIG. 5 illustrates an initial step in the present invention memory cellfabrication process. After complete fabrication of all electronics(transistor elements) onto a silicon substrate, the wafer is passivatedwith oxide. A metal interconnect for the memory cell and the associatedtransistor is formed and planarized using any state-of-the-art means,such as chemical-mechanical polishing (CMP) process. A stack includingthe bottom electrode 102, memory resistor thin film 106, top electrode110, and a hard mask material 600 is formed.

FIGS. 6 a through 6 d illustrate additional steps in the fabrication ofan RRAM memory cell using the asymmetric-area CMR film. In FIG. 6 aphotoresist is used to etch hard mask 600, top electrode 110, and memoryresistor thin film 106. The memory resistor thin film 106 is partiallyetched. The remaining memory film (third thickness portion 124) is 20%to 80% of the original film thickness 120.

In FIG. 6 b the photoresist is stripped. From 50 nm to 200 nm of siliconnitride is deposited. The silicon nitride is etched to form passivatedetched memory resistor thin film sidewalls (130 a and 130 b).

In FIG. 6 c the remaining memory resistor thin film is etched. First, asecond silicon nitride is deposited, 20 nm to 100 nm thick. Then, thebottom electrode is etched.

The hard mask may be removed in either the processes of FIG. 6 b or FIG.6 c. In FIG. 6 d oxide is deposited. Optionally, a CMP planarizationprocess can be performed, and then another metal interconnect 602 isformed.

In some aspects, a refractory metal is used as part of the bottomelectrode. The refractory metal is dry etched, at least partially, usinga sputtering process. In a conventional memory cell process it would belikely that some of the refractory metal removed from the bottomelectrode would be re-deposited on the sidewalls of the memory resistorstack, degrading memory resistor properties. However, the presentinvention memory cell sidewall insulators protect against refractorymetal re-deposition, improving the process yield.

FIG. 7 is a flowchart illustrating the present invention method forforming an asymmetric-area memory cell. Although the method is depictedas a sequence of numbered steps for clarity, no order should be inferredfrom the numbering unless explicitly stated. It should be understoodthat some of these steps may be skipped, performed in parallel, orperformed without the requirement of maintaining a strict order ofsequence. The method starts at Step 700.

Step 704 forms a bottom electrode having an area, see FIG. 3 for thedefinition of “area”. In some aspects the bottom electrode is formedfrom a material such as TiN/Ti, Pt/TiN/Ti, In/TiN/Ti, PtRhOx compounds,or PtIrOx compounds. Step 706 forms a CMR memory film overlying thebottom electrode, having an asymmetric area. The CMR memory film can beformed from a Pr_(0.3)Ca_(0.7)MnO₃ (PCMO) memory film. Step 708 forms atop electrode having an area, less than the bottom electrode area,overlying the CMR film. The top electrode can be formed from TiN,TiN/Pt, TiN/In, PtRhOx, or PtIrOx compounds.

Forming a CMR film with an asymmetric area (Step 706) includes forming aCMR film with a first area adjacent the top electrode and a second area,greater than the first area, adjacent the bottom electrode. In someaspects of the method, the CMR film first area is approximately equal tothe top electrode area. In other aspects, the CMR film second area isless than the bottom electrode area.

More specifically, the method may comprise additional steps. Step 702 aisotropically deposits a bottom electrode (BE) layer. Step 702 bisotropically depositing a CMR film layer, having a first thickness,overlying the bottom electrode layer. Step 702 c isotropically depositsa top electrode (TE) layer overlying the CMR film layer. Then, formingthe top electrode area (Step 708) and the CMR film first area (Step 706)includes etching the top electrode layer and a second thickness portionof the CMR film layer.

Step 702 d forms a first set of sidewall insulators adjacent the topelectrode and the second thickness portion of the CMR film. In someaspects the sidewall insulators are formed from a material such assilicon nitride or aluminum oxide, having a thickness in the range of 50to 200 nm. Then, forming a CMR film second area (Step 706) includesetching the remaining portion of the CMR film layer, leaving a thirdthickness portion of the CMR film second area underlying the first setof sidewall insulators, where the third thickness is equal to the firstthickness minus the second thickness. In some aspects the CMR thirdthickness is in the range of 20 to 80% of the first thickness. In otheraspects, forming a CMR memory film (Step 706) includes forming a CMRfilm first thickness in the range of 50 to 350 nanometers.

Step 702 e forms a second set of sidewall insulators overlaying thefirst set of sidewall insulators and adjacent the third thicknessportion of the CMR film. In some aspects the second set of sidewallinsulators are formed from a silicon nitride or aluminum oxide material,having a thickness in the range of 20 to 100 nm. Then, forming a bottomelectrode having an area (Step 704) includes etching the bottomelectrode layer, leaving a bottom electrode area underlying the firstand second set of sidewall insulators.

FIG. 8 is a flowchart illustrating the present invention method forforming an RRAM asymmetric-area memory cell. The method starts at Step800. Step 802 forms a CMOS transistor with source and drain activeregions. Step 804 forms a metal interlevel interconnect to a transistoractive region (either the source or drain). Steps 802 and 804 can beperformed using conventional processes known in the art. Step 806 formsa bottom electrode having an area overlying the interlevel interconnect.Step 808 forms a CMR memory film overlying the bottom electrode, havingan asymmetric area. Step 810 forms a top electrode having an area, lessthan the bottom electrode area, overlying the CMR film. Steps 806, 808,and 810 are described in more detail in the explanation of FIG. 7.

FIG. 9 is a flowchart illustrating the present invention method forprogramming an asymmetric-area memory cell using bipolar and uni-polarpulses. The method starts at Step 900. Step 902 applies a first voltagepulse with a first polarity to a memory cell top electrode. As describedbelow, the first pulse is relatively narrow. Step 904, in response tothe first pulse, creates a low resistance in an asymmetrical-areacolossal magnetoresistance (CMR) memory film. Step 906 applies a second(narrow) voltage pulse with a second polarity, opposite of the firstpolarity, to the memory cell top electrode. Step 908, in response to thesecond pulse, creates a high resistance in the asymmetric-area CMRmemory film. Step 910 applies a third pulse, having the same polarity asthe second pulse, and a pulse width of greater than 1 microsecond. Step912, in response to the third pulse, creates a low resistance in the CMRmemory film.

Creating a low resistance in the CMR memory film in response to thefirst pulse (Step 904) includes creating a low resistance in anarrow-area region of the asymmetric-area CMR memory film. In someaspects, the low resistance created in the CMR memory film is in therange of 1000 to 10 k ohms. Creating a high resistance in the CMR memoryfilm (Step 908) includes creating a high resistance in the narrow arearegion of the asymmetric-area CMR memory film. The high resistancecreated in the CMR memory film is in the range of 100 k to 10 M ohms.

In some aspects applying a first pulse with a first polarity to thememory cell top electrode (Step 902) includes applying a voltage pulsewith a width in the range of 5 to 500 nanoseconds (ns). Applying asecond pulse with a second polarity to the memory cell top electrode(Step 906) includes applying a voltage pulse with a width in the rangeof 5 to 500 ns.

Assuming that the CMR film has a thickness in the range of 50 to 350nanometers, Step 902 applies a first pulse with a voltage amplitude inthe range of 2 to 6 volts, and Step 906 applies a second pulse with avoltage amplitude in the range of 2 to 6 volts.

In some aspects, creating a low resistance in a narrow-area region ofthe asymmetric-area CMR memory film in response to the first pulse (Step904) includes creating a low resistance in response to a first electricfield in the narrow-area region of the CMR memory film, and a secondelectric field, with a field intensity less than the first field, in awide-area region of the CMR memory film. The first and second fieldshave the same polarity. Likewise, creating a high resistance in a narrowarea region of the asymmetric-area CMR memory film (Step 908) includescreating a high resistance in response to a third electric field in thenarrow-area region of the CMR memory film, opposite in polarity to thefirst field, and a fourth electric field, with a field intensity lessthan the third field, in a wide-area region of the CMR memory film. Thethird and fourth fields have the same polarity.

As an example, Step 902 applies a positive polarity pulse, and Step 904creates a low resistance in a narrow-area region adjacent the topelectrode. This example assumes that the memory cell is constructed asthe memory cell depicted in FIG. 2. Continuing the example, Step 906applies a negative polarity pulse. Then, creating a high resistance in anarrow-area region of the asymmetric-area CMR memory film (Step 908)includes creating a high resistance in a narrow-area region adjacent thetop electrode. The pulse polarities mentioned in this example would bereversed if the top electrode, and the CMR film area adjacent the topelectrode, were wider than the bottom electrode (the asymmetry wasreversed).

An asymmetric-area memory cell, a corresponding RRAM structure,programming procedure, and fabrication process have been presented.Specific details, such as widths, thicknesses, and materials have beenused to illustrate the invention. However, the invention is not limitedto merely these examples. Other variations and embodiments of theinvention will occur to those skilled in the art.

1-20. (canceled)
 21. An asymmetric-area memory cell comprising: a bottomelectrode having an area; a colossal magnetoresistance (CMR) memory filmoverlying the bottom electrode, having an asymmetric area; and, a topelectrode having an area, less than the bottom electrode area, overlyingthe CMR film.
 22. The memory cell of claim 21 wherein a CMR film has afirst area adjacent the top electrode and a second area, greater thanthe first area, adjacent the bottom electrode.
 23. The memory cell ofclaim 22 wherein the CMR film first area is approximately equal to thetop electrode area.
 24. The memory cell of claim 23 wherein the CMR filmsecond area is less than the bottom electrode area.
 25. The memory cellof claim 24 wherein the CMR memory film has an overall first thickness,a second thickness portion with the first area, and a third thicknessportion with the second area underlying the second thickness portion,where the third thickness is equal to the first thickness minus thesecond thickness.
 26. The memory cell of claim 25 further comprising: afirst set of sidewall insulators adjacent the top electrode and thesecond thickness portion of the CMR film; and, a second set of sidewallinsulators overlaying the first set of sidewall insulators and adjacentthe third thickness portion of the CMR film.
 27. The memory cell ofclaim 26 wherein the CMR film third thickness in the range of 20 to 80%of the first thickness.
 28. The memory cell of claim 25 wherein the CMRfilm first thickness is in the range of 50 to 350 nanometers.
 29. Thememory cell of claim 26 wherein the first set of sidewall insulators isformed from a material selected from the group including silicon nitrideand aluminum oxide, each sidewall having a thickness in the range of 50to 200 nanometers (nm).
 30. The memory cell of claim 29 wherein thesecond set of sidewall insulators is formed from a material selectedfrom the group including silicon nitride and aluminum oxide, eachsidewall having a thickness in the range of 20 to 100 nm.
 31. The memorycell of claim 21 wherein the bottom electrode is formed from a materialselected from the group including TiN/Ti, Pt/TiN/Ti, In/TiN/Ti, PtRhOxcompounds, and PtIrOx compounds; and, wherein the top electrode isformed from a material selected from the group including TiN, TiN/Pt,TiN/In, PtRhOx compounds, and PtIrOx compounds.
 32. The memory cell ofclaim 21 wherein the CMR memory film is formed from Pr_(0.3)Ca_(0.7)MnO₃(PCMO).
 33. An RRAM asymmetric-area memory cell comprising: a CMOStransistor with source and drain active regions; a metal interlevelinterconnect overlying a transistor active region; a bottom electrodehaving an area, overlying the interlevel interconnect; a colossalmagnetoresistance (CMR) memory film overlying the bottom electrode,having an asymmetric area; and, a top electrode having an area, lessthan the bottom electrode area, overlying the CMR film.